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In the field of lithium-ion battery research and development, understanding the dynamic changes in the microstructure of electrode materials during charge and discharge processes is crucial. Traditional offline detection methods cannot capture these changes in real time, while the emergence of in situ characterization techniques provides researchers with a powerful tool. Leveraging its expertise in X-ray diffraction (XRD) technology, Dandong Tongda Technology Co., Ltd. has developed an in situ battery accessory for battery research, offering an efficient window to explore the reaction processes inside the "black box" of batteries. Technical Principle: Dynamically Monitoring Microscale Changes in Battery Materials The core design goal of Dandong Tongda's originally battery accessory is to enable real-time monitoring of the evolution of the crystal structure of electrode materials using X-ray diffraction (XRD) technology while the battery is operating normally (during charge and discharge). This accessory typically needs to work in synergy with an electrochemical testing system (such as the LAND battery test system) and an X-ray diffractometer (such as Tongda Tech's TD-3500 model). It forms a specialized battery chamber that allows X-rays to penetrate and probe the electrode materials of the battery during operation. The key lies in the design of window materials (such as beryllium windows) with extremely low X-ray absorption rates on the battery components, ensuring effective incidence and emission of X-rays. Simultaneously, the accessory integrates necessary electrodes, insulation, and sealing components to ensure normal electrochemical reactions and maintain excellent sealing during testing. Key Functions and Application Value The value of this in situ battery accessory lies in its ability to help researchers intuitively and dynamically observe a series of microscopic changes in electrode materials during battery charge and discharge processes: Real-Time Observation of Phase Transition Processes: Many electrode materials undergo phase transitions during lithium-ion intercalation and deintercalation. In situ XRD can capture the formation, disappearance, and transformation of these phases in real time, which is critical for understanding the battery's reaction mechanisms. Monitoring Lattice Parameter Changes: By precisely tracking the shifts in XRD diffraction peaks, subtle changes in lattice parameters can be calculated, reflecting the expansion and contraction of the lattice. This is closely related to battery performance metrics such as voltage platforms and cycle life. Unveiling Capacity Decay Mechanisms: Capacity decay during battery cycling is often related to structural degradation of electrode materials, side reactions, and other factors. In situ monitoring can correlate electrochemical performance degradation with structural changes, providing direct insights for improving battery materials and optimizing design. Accelerating New Material Development: For evaluating novel electrode materials, in situ XRD technology can quickly provide key information on structural stability and reaction pathways, speeding up the R&D process.
The multifunctional integrated measurement accessory of X-ray diffractometer (XRD) is a key component for achieving multi scene and multi-scale analysis. Through modular design, it can meet the needs of powder diffraction, small angle scattering, residual stress analysis, in-situ testing, etc. The following are common multifunctional integrated measurement accessories and their core functions: 1. The multifunctional integrated measurement accessory is a temperature and environmental control accessory (1) Function: Supports sample testing under high temperature, low temperature, and humidity control, used to study the crystal structure changes of materials under different temperature or humidity conditions. (2) Characteristics: Temperature range: from room temperature to 1500 ℃; Automatic temperature control and humidity regulation, suitable for in-situ catalysis, phase change analysis and other experiments. (3) Application: Phase transition of metal materials, analysis of polymer crystallinity, research on thermal stability of inorganic materials. 2. Automatic sampler and sample stage for multifunctional integrated measurement accessories (1) Function: Implement automatic switching and precise positioning of multiple samples to improve testing efficiency. (2) Characteristics: Supporting accessories such as sample rotation tables and micro diffraction tables for directional testing of complex samples; Collaborate with intelligent software to optimize measurement parameters and automatically identify sample configurations. (3) Application: Batch sample testing, thin film or micro area analysis. 3. Multi functional integrated measurement accessories suitable for two-dimensional detectors and high-speed one-dimensional detectors (1) Function: Support multi-dimensional data collection to enhance the analysis capability of complex samples. (2) Features: High speed one-dimensional detector, suitable for conventional powder diffraction; Two dimensional semiconductor array detector that can switch between zero dimensional, one-dimensional, or two-dimensional modes, expanding micro area or dynamic in-situ testing capabilities. (3) Application: 2D material crystal orientation analysis, in-situ reaction dynamic monitoring. 4. The multifunctional integrated measurement attachment is a residual stress and micro area diffraction attachment (1) Function: Conduct directional testing on the stress distribution or small areas on the surface of materials. (2) Features: Combining the θ/θ optical system with a microfocus X-ray source to achieve sub millimeter level micro diffraction; Non destructive measurement, used for stress analysis of metal workpieces and semiconductor devices. (3) Application: Fatigue testing of aerospace components, stress characterization of semiconductor thin films. 5. The multifunctional integrated measurement accessory is an intelligent calibration and automation control accessory (1) Function: Ensure testing accuracy and consistency through component recognition and automatic calibration technology. (2) Features: QR code automatic recognition attachment configuration, software guided optimal testing conditions; Fully automatic calibration program to reduce human operation errors. (3) Application: Complex attachment switching (such as high temperature+AXS mode), beginner friendly operation. The accessory design of modern X-ray diffractometers emphasizes modularity, intelligence, and automation. Through software and hardware collaboration, accessories can be quickly switched, parameters optimized, and data standardized. Future trends include higher precision micro area analysis capabilities, integrated solutions for in-situ dynamic testing, and intelligent accessory management systems driven by artificial intelligence.
Parallel optical film measuring accessory is a specialized component used in X-ray diffractometers, mainly for enhancing the signal intensity and detection accuracy of thin film samples. 1.Core functions of parallel optical film measuring accessories Suppressing scattering interference: By increasing the length of the grating, filtering out more scattered rays, reducing the interference of the substrate signal on the diffraction results of the thin film, and thus improving the signal strength of the thin film. Improving the accuracy of thin film analysis: Suitable for thickness testing and other scenarios of nano multilayer thin films, combined with small angle diffraction attachments, low angle diffraction analysis in the range of 0°~5°can be achieved. 2. Structural characteristics of parallel optical film measuring accessories Grating design: By extending the length of the grating, optimizing the X-ray path, enhancing the filtering ability of scattered rays, and ensuring the purity of the thin film diffraction signal. 3. Application scope of parallel optical film measuring accessory Research on thin film materials: crystal structure analysis of nano multilayer films and ultra-thin films. Semiconductor and coating testing: used to evaluate the uniformity, crystalline quality, and other characteristics of thin films. 4. Compatible equipment for parallel optical film measuring accessory This attachment can be adapted to various X-ray diffractometer models, including: TD-3500 X-ray diffractometer TD-5000 X-ray single crystal diffractometer TD-3700 high-resolution X-ray diffractometer TDM-20 desktop X-ray diffractometer Overall, the parallel optical film measuring accessory significantly improves the diffraction signal quality of thin film samples through structural optimization and scattering suppression, and is widely used in materials science, semiconductor manufacturing, and other fields, especially suitable for high-precision analysis needs of nanoscale thin films.
The high temperature accessory in a diffractometer is an additional device that can perform X-ray diffraction analysis on samples under high temperature conditions. To understand the changes in crystal structure of samples during high-temperature heating and the changes in mutual dissolution of various substances during high-temperature heating. Working principle of high temperature accessory: By using methods such as resistance heating, induction heating, or radiation heating, the sample is heated within a set temperature range. At the same time, it is equipped with high-precision temperature sensors and control systems to monitor and adjust the temperature of the sample in real time, ensuring the stability and accuracy of the temperature. The temperature control accuracy can reach ±0.5℃ or even higher. In order to maintain the stability of the sample at high temperatures and prevent it from reacting with oxygen in the air, high temperature accessory usually require an atmosphere protection system. Common atmospheres include inert gases such as argon, nitrogen, etc. The atmosphere control system can accurately control the flow rate and pressure of the atmosphere, providing a stable experimental environment for the sample. The main functions of high temperature accessory is: Real time monitoring of sample phase transition, chemical reactions, crystal structure changes, and other processes can be carried out in high-temperature environments to obtain information on the structure and properties of substances at different temperatures. By analyzing the position, intensity, and shape of diffraction peaks, the crystal cell parameters, crystal structure, phase composition, and other information of the sample can be obtained, and the content of each component can be accurately measured. Study the rate, mechanism, and diffusion behavior of chemical reactions. For example, observing the structural changes of catalysts during high-temperature reactions, understanding the formation and disappearance of their active centers, and optimizing the performance of catalysts. Application area of high temperature accessory: Used to study the phase transition, crystal structure evolution, and performance changes of high-temperature superconducting materials, metal alloys, ceramic materials, etc. at different temperatures, providing a basis for material design and preparation. Monitoring the changes in substances during chemical reactions, such as studying the structural changes of catalysts and the evolution of active centers in high-temperature catalytic reactions, can help develop efficient catalysts. Study the physical properties of substances at high temperatures, such as magnetism, electronic structure, and their relationship with temperature, and explore new physical phenomena and laws. Technical parameter of high temperature accessory: Temperature setting: Inert gas environment from room temperature to 1200 ℃ Vacuum environment: high temperature of 1600 ℃ Temperature control accuracy: ± 0.5 ℃ Window material: Polyester film Cooling method: deionized water circulation cooling In summary, the high temperature accessory in the diffractometer is an important testing tool that can perform X-ray diffraction analysis on samples under high temperature conditions, providing strong support for research in fields such as materials science, chemical engineering, and physics.
Parallel optical film measuring accessory is an optical component used to enhance the signal intensity of thin films and reduce the influence of substrate signals on measurement results. Usually used in optical experiments or instruments, mainly for generating parallel beams or conducting optical measurements on thin film samples. By increasing the length of the grating, more precise control and filtering of light can be achieved. When light passes through, the grating plate can filter out more scattered lines, making the transmitted light purer and more concentrated, thereby reducing the interference of scattered light on the thin film signal and enhancing the signal strength of the thin film itself, improving the accuracy and reliability of measurement. 1. Main function of parallel optical film measuring accessory Improving measurement accuracy: In thin film related detection and analysis, such as thin film thickness measurement, optical constant determination, etc., parallel light thin film attachments can effectively reduce the influence of substrate signals, making the measurement results closer to the true characteristics of the thin film, thereby improving measurement accuracy and precision. Enhance signal strength: It helps to increase the intensity of the light signal reflected or transmitted by the thin film, which is particularly important for some thin film samples with weaker signals. The enhanced signal can be more clearly received and recognized by the detector, reducing the detection limit and improving the sensitivity of the instrument for detecting thin film samples. Improving image quality: In some applications that require imaging observation of thin films, such as observing the surface morphology of thin films under a microscope, parallel light thin film attachments can reduce background noise and blurring caused by scattered light, making the image of the thin film clearer, higher contrast, and easier to observe and analyze the detailed structure of the thin film. 2. Main components of parallel optical film measuring accessory Light source: Typically, lasers, LEDs, or other monochromatic light sources are used. Collimator lens: converts divergent light beams into parallel light. Sample stand: used for placing film samples, usually adjustable in position and angle. Detector: used to receive transmitted or reflected light signals for measurement and analysis. 3. Application fields of parallel optical film measuring accessory Optical research: used to study the optical properties of thin films, such as interference, diffraction, etc. Materials Science: Used to measure the thickness and refractive index of thin films and evaluate material properties. Industrial testing: used for quality control and testing in film production. 4. Instructions for parallel optical film measuring accessory Adjust the light source: Ensure that the light source is stable and the beam is uniform. Collimated beam: Adjust the beam of light through a collimating lens to make it parallel. Place the sample: Place the film sample on the sample stage, adjust the position and angle. Measurement and analysis: Use detectors to receive light signals, record data, and perform analysis. 5. Precautions Light source stability: Ensure the stability of the light source to avoid measurement errors. Cleaning of optical components: Keep the optical components clean to avoid dust and stains affecting the measurement results. Sample preparation: Ensure that the film sample is uniform and defect free to obtain accurate measurement results. In summary, the parallel optical film measuring accessory is an important optical component that plays a crucial role in multiple fields and is of great significance in promoting scientific research and technological progress in related fields.
The medium and low temperature accessory of an X-ray diffractometer is a key component used for X-ray diffraction analysis in low-temperature environments.The medium and low temperature accessory is widely used in research and development work in materials science, physics, chemistry, and other fields, especially suitable for scenarios that require structural analysis of materials under different temperature conditions. In order to understand the changes in crystal structure during low-temperature refrigeration process, the following are the technical parameters of the medium and low temperature accessory: Vacuum environment:- 196~500℃ Temperature control accuracy: ± 0.5 ℃ Refrigeration method: liquid nitrogen (consumption less than 4L/h) Window material: Polyester film Cooling method: deionized water circulation cooling In short, the medium and low temperature accessory of X-ray diffractometer is important equipment component that can provide strong support for scientific research and material analysis.The medium and low temperature accessory of a diffractometer is one of the important tools in the field of material structure analysis, with broad application prospects and significant research value.The medium and low temperature accessory of the diffractometer is a key component to ensure the normal operation and accurate measurement of the instrument under low-temperature conditions. Its design and performance directly affect the accuracy and reliability of experimental results. When selecting and applying medium and low temperature accessory, experimental requirements, sample characteristics, as well as the technical parameters and performance characteristics of the accessories should be fully considered to ensure the best experimental results.
The parallel optical film measuring accessory increases the length of the grating plate to filter out more scattered lines, which is beneficial for reducing the influence of the substrate signal on the results and enhancing the signal intensity of the film.
The medium and low temperature accessory is designed to understand the changes in crystal structure during the low-temperature refrigeration process.
The parallel optical film measuring accessory increases the length of the grating plate to filter out more scattered lines, which is beneficial for reducing the influence of the substrate signal on the results and enhancing the signal intensity of the film.
High temperature accessory are designed to understand the changes in the crystal structure of samples during high-temperature heating, as well as the changes in mutual dissolution of various substances during high-temperature heating.
Parallel optical film measuring accessory increases the length of the grating plate to filter out more scattered lines, which is beneficial for reducing the influence of the substrate signal on the results and enhancing the signal intensity of the film.