Parallel optical film measuring accessory is a specialized component used in X-ray diffractometers, mainly for enhancing the signal intensity and detection accuracy of thin film samples.

1.Core functions of parallel optical film measuring accessories

Suppressing scattering interference: By increasing the length of the grating, filtering out more scattered rays, reducing the interference of the substrate signal on the diffraction results of the thin film, and thus improving the signal strength of the thin film.

Improving the accuracy of thin film analysis: Suitable for thickness testing and other scenarios of nano multilayer thin films, combined with small angle diffraction attachments, low angle diffraction analysis in the range of 0°~5°can be achieved.

2. Structural characteristics of parallel optical film measuring accessories

Grating design: By extending the length of the grating, optimizing the X-ray path, enhancing the filtering ability of scattered rays, and ensuring the purity of the thin film diffraction signal.

3. Application scope of parallel optical film measuring accessory

Research on thin film materials: crystal structure analysis of nano multilayer films and ultra-thin films.

Semiconductor and coating testing: used to evaluate the uniformity, crystalline quality, and other characteristics of thin films.

4. Compatible equipment for parallel optical film measuring accessory

This attachment can be adapted to various X-ray diffractometer models, including:

TD-3500 X-ray diffractometer

TD-5000 X-ray single crystal diffractometer

TD-3700 high-resolution X-ray diffractometer

TDM-20 desktop X-ray diffractometer

Overall, the parallel optical film measuring accessory significantly improves the diffraction signal quality of thin film samples through structural optimization and scattering suppression, and is widely used in materials science, semiconductor manufacturing, and other fields, especially suitable for high-precision analysis needs of nanoscale thin films.