Thin Film Diffraction
1. Thin Film Diffraction can perform high-speed data acquisition.
2. Thin Film Diffraction is easy to operate and has a long service life.
3. Thin Film Diffraction is powerful and highly intelligent.
- Tongda
- Liaoning, China
- 1—2 months
- 100 units per year
- Information
Introduction of Thin Film Diffraction:
X-ray testing techniques are widely used in the characterization of various thin film materials. Thin film materials are different from ordinary powder XRD characterization, and there are certain limitations and characteristics of thin films. For example, when the film has a strong preferred orientation, only the diffraction of specific crystal planes can be observed, which is why the test characterization of the film is more difficult than that of ordinary powders.
Application of Thin Film Diffraction:
Thin Film Diffraction is a standard equipment for the characterization of semiconductor materials, and is often used in research and production quality control of materials science and nanotechnology, semiconductor materials and devices, etc. Thin Film Diffraction is suitable for testing various thin film samples, especially for structural analysis and characterization of epitaxial thin films and single crystal wafers.
Advantages of Thin Film Diffraction:
1. Thin Film Diffraction can perform high-speed data acquisition.
2. Thin Film Diffraction is easy to operate and has a long service life.
3. Thin Film Diffraction is powerful and highly intelligent.
